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Savannah® has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah®’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

Key features include:
  • In-Situ Ellipsometry
  • In-Situ QCM
  • Self Assembling Monolayers
  • 2-Second Cycle Times
  • Integrated Ozone
  • Low Vapor Pressure Deposition
  • Batch Processing
  • Glove Box Integration

Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah® is available in three configurations: S100, S200, and S300. Savannah® is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah® thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah® is capable of handling gas, liquid, or solid precursors.

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Savannah® G2 Technical specifications
Substrate Size Savannah S100: up to 100 mm
Savannah® S200: up to 200 mm
Savannah® S300: up to 300 mm
Dimensions (w x d x h) Savannah S100: 585 x 560 x 980 mm
Savannah® S200: 585 x 560 x 980 mm
Savannah® S300: 686 x 560 x 980 mm
Cabinet Steel with white powder coat paint with removable panels and lockable precursor door
Operational Modes Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)
Power 115 VAC or 220 VAC,1500 W (excluding pump)
Controls LabVIEW™, Windows™ 7, Lenovo Laptop, USB control
Maximum Substrate Temperature S100: RT – 400 °C
S200: RT – 350 °C
S300: RT – 350 °C
Deposition Uniformity (Al2O3) <1% (1σ)
Cycle Time <2 seconds per cycle with Al2O3 at 200 °C
Vacuum Pump Alcatel 2021C2 – 14.6 CFM
Compatibility Clean room class 100 compatible
Compliance CE, TUV, FCC
Precursor Delivery System, Ports 2 lines standard, up to 6 lines available
Each line accommodates solid, liquid and gas precursors
Lines can be independently heated up to 200 °C
Precursor Delivery System, Valves Industry standard high speed ALD valves with 10 msec response time
Precursor Cylinders Individually heated 50 ml stainless steel cylinders, optional larger cylinders available
Carrier/Venting Gas N2 mass flow controlled, 100 SCCM
Options Low Vapor Pressure Delivery (LVPD) System
Ozone Generator
Dome lid for wafer cassette or 3D objects
Glove box Interface
In-Situ Ellipsometry
In-Situ Quartz Crystal MicroBalance (QCM)
Self Assembling Monolayers (SAMs)
Particle Coating

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